ACERDE is an expert of advanced metal-ceramic materials, using HTCVD process
(High Temperature Chemical Vapor Deposition).

The main advantage of this technology compared to the classical CVD (Chemical Vapor Deposition) or PVD (Physical Vapor Deposition) processes is the capabilities to produce metal-ceramic materials, with the following properties:

Carbide coating into a customer tube                            Tantalum Carbide coating on Graphite fiber material

Acerde addresses three main markets today:

• Materials on Demand. Acerde is providing advanced metal-ceramic materials to address the harshest possible environmental applications. Acerde’s materials on demand are used in metallurgical or nuclear industries, research centers (medical, aerospace, astronomy), as well as microelectronics manufacturers.
  
• X-ray tube anodes for CT Scanners (Computed Tomography). Acerde is developing innovative solutions for the CT Scanners, based on its HTCVD technology. The Acerde’s X-ray Tube targets are much lighter, more powerful and have a longer life cycle (superior to 30%).
  
• AlN poly and monocristallin materials. Acerde is producing single crystals of AlN using HTCVD technics. This material is suitable for the manufacturing of deep UV LED’s (used in the water purification process) or piezoelectric sensors for very high temperature operations.

Acerde’s unique expertise and proprietary process allows the growth of μm thin layers as well as mm thick bulk materials.

Based on its HTCVD technology, Acerde is able to provide coatings with the following advanced metal-ceramic materials:

• Silicon Carbide coating (SiC)*
  The Silicon Carbide is highly wear resistant with good mechanical properties, high temperature strength and thermal shock resistance.
  
• Titanium Nitride coating (TiN)
  The Titanium Nitride is mainly used as a chemical diffusion barrier to improve the thermal coating stability.
  
• Titanium Carbide coating (TiC)
  The Titanium Carbide is used as the Titanium Nitride as a chemical diffusion barrier.
  
• Tungsten coating (W) *
  The Tungsten is an exceptional material as the hardest pure metal with the highest melting point of all metals, a high oxidation resistance and very high density.
  
• Tungsten carbide coating (WC)*
  The Tungsten carbide material has a high density, high melting point, high hardness with a low electrical resistivity.
  
• Tungsten Rhenium coating (WRe)
  The Tungsten Rhenium is the most appropriate material for X-Ray generation/emission.
  
• Rhenium coating (Re)
  The Rhenium is mainly used as well as a chemical diffusion barrier material.
  
• Boron Nitride coating (BN)
  The Boron Nitride is mainly used for all problems linked to abrasion at high temperature (liquid metals for example).  The Boron nitride is used as well as a non-sticking coating.
  
• Aluminum Nitride coating (AlN)*
  The aluminum Nitride has a high thermal conductivity, some piezoelectric properties and is an interesting material for the production of UV LEDs.
  
• Tantalum coating (Ta)
  The Tantalum is not sensitive to corrosive attacks by acids or liquid metals.
  
• Tantalum Carbide coating (TaC)
  The Tantalum Carbide is used as a protection layer against high corrosive ambient. The Tantalum Carbide is resistant to very high temperature as its fusion point is equal to 3880°C (7016°K)
  
• Max phase coating (Ti3SiC2)
  This max-phase is used as a protection layer, according to its high mechanical properties and is inert under neutron bombardment.